Title of article :
TEM and nanoindentation studies on sputtered Ti40Ni60 thin films
Author/Authors :
A.K. Nanda Kumar، نويسنده , , C.K. Sasidharan Nair، نويسنده , , M.D. Kannan b، نويسنده , , S. Jayakumar، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2006
Pages :
7
From page :
308
To page :
314
Abstract :
Ti40Ni60 thin films were sputter deposited from an equiatomic alloy target onto Si(1 0 0) substrates and the mechanical response of these films have been studied. The compositions of the films were determined by RBS. The transformation of the amorphous films into an ordered B2 Austenite phase on annealing was confirmed by electron microscopy. The effects of second phase segregation and superlattice formation and their implication on the electron diffraction patterns have been discussed. The mechanical response of the films to indentation was studied by a standard Hysitron triboindenter. The deformation behavior of the films was analysed via a series of load–displacement (P–h) curves and the singular occurrence of intermittent discontinuities in the otherwise smooth P–h curves are attributed to the onset of plastic deformation. Mechanical response parameters like hardness and Youngʹs modulus have been determined from the unloading curve as per the standard Oliver–Pharr analysis.
Keywords :
Thin film , Hardness , Oliver–Pharr analysis , Nanoindentation , Youngיs modulus , Austenite phase , TiNi shape memory alloy
Journal title :
Materials Chemistry and Physics
Serial Year :
2006
Journal title :
Materials Chemistry and Physics
Record number :
1064338
Link To Document :
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