• Title of article

    Effect of pH and current density in electrodeposited Co–Ni–P alloy thin films

  • Author/Authors

    Kyung Seek Lew، نويسنده , , M. Raja، نويسنده , , S. Thanikaikarasan، نويسنده , , Taekyu Kim، نويسنده , , Yong Deak Kim، نويسنده , , T. Mahalingam، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2008
  • Pages
    5
  • From page
    249
  • To page
    253
  • Abstract
    Co–Ni–P alloy thin films have been electrodeposited from sulfate baths at various solution pH and current density values. The effect of pH and current density on compositional, structural, morphological, and magnetic properties of these films was investigated by EDAX (energy dispersive analysis of X-ray spectroscopy), XRD (X-ray diffractometer system), AFM (atomic force microscope) and VSM (vibrating sample magnetometer). The reaction mechanism of individual deposition of Co, Ni and Co–Ni–P were investigated by cyclic voltammetry. The EDAX results revealed that cobalt and phosphorous content were high and nickel content was low at high solution pH and at low current density. X-ray diffraction studies exhibit that the intensity of hcp and Co–Ni–P amorphous phases increases and the intensity of fcc phase decreased when increasing the solution pH and decreasing the value of current density. The surface morphology of the films were observed by AFM. The deposited films exhibit hard magnetic properties at high pH value and soft magnetic properties at low pH value.
  • Keywords
    X-ray diffraction , AFM , Co–Ni–P , Electrodeposition , coercivity
  • Journal title
    Materials Chemistry and Physics
  • Serial Year
    2008
  • Journal title
    Materials Chemistry and Physics
  • Record number

    1066269