Title of article
Effects of rapid thermal annealing on optical quality of GaNP alloys
Author/Authors
W.M.، Chen, نويسنده , , M.، Izadifard, نويسنده , , I.A.، Buyanova, نويسنده , , J.P.، Bergman, نويسنده , , A.، Utsumi, نويسنده , , Y.، Furukawa, نويسنده , , A.، Wakahara, نويسنده , , H.، Yonezu, نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2004
Pages
-334
From page
335
To page
0
Abstract
Significant improvements in radiative efficiency of GaNP epilayers grown on GaP substrates by solid-source molecular beam epitaxy (MBE) are achieved by post-growth rapid thermal annealing (RTA). From temperature-dependent CW and timeresolved photoluminescence (PL) spectroscopies combined with PL excitation measurements, the observed improvements are attributed to annealing out of competing nonradiative centres. This conclusion is supported by the following experimental evidence: reduced thermal quenching of the PL intensity resulting in a substantial (up to 18 times) increase at room temperature (RT) after RTA, and simultaneous improvements in carrier lifetime at RT deduced from time-resolved PL measurements.
Keywords
Quantum dots , immunoglobulin G , Fluorescence resonance energy transfer
Journal title
IEE PROCEEDINGS OPTOELECTRONICS
Serial Year
2004
Journal title
IEE PROCEEDINGS OPTOELECTRONICS
Record number
106722
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