Title of article :
Thermal conduction induced by electron-beam
Author/Authors :
Basil T. Wong، نويسنده , , M. Pinar Mengüç، نويسنده , , R. Ryan Vallance، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
9
From page :
5099
To page :
5107
Abstract :
The electron-energy deposition profile within the workpiece, induced by a perpendicularly impinging electron-beam, is obtained by solving the electron-beam transport equation via a Monte Carlo approach. The profile serves as the external electron generation in the two-temperature model. The beam is assumed to be a continuous source (not pulsed), and the energy exchange between the electron-beam and the target workpiece occurs at a time scale much shorter than the characteristic time of thermal conduction by electrons and phonons inside the workpiece. A series of numerical results explain the details of the heating phenomena at the nanoscale using an electron-beam.
Keywords :
Sublimation , Electron-beam propagation , Two-temperature model , Monte Carlo method , Nanomachining , Electron–phonon coupling
Journal title :
INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER
Serial Year :
2007
Journal title :
INTERNATIONAL JOURNAL OF HEAT AND MASS TRANSFER
Record number :
1075145
Link To Document :
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