Title of article
Microtribological properties of ultrathin C60 films grown by molecular beam epitaxy
Author/Authors
H Nakagawa، نويسنده , , Yukari Kibi، نويسنده , , M Tagawa، نويسنده , , M Umeno، نويسنده , , N Ohmae، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2000
Pages
3
From page
45
To page
47
Abstract
Molecular beam epitaxy (MBE) has been applied to a condensation of thin C60 films with high crystallinity. In situ measurements with reflection high energy electron diffraction (RHEED) showed an epitaxial growth of C60 film with a lattice constant of 1.0 nm on a MoS2 substrate. Atomic force microscopy (AFM) and friction force microscopy (FFM) revealed a low friction coefficient of 0.012, the lowest value reported to date for C60.
Keywords
C60 , Microtribology , Molecular beam epitaxy
Journal title
Wear
Serial Year
2000
Journal title
Wear
Record number
1083859
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