Title of article
Electrocoagulation of chemical mechanical polishing wastewater Original Research Article
Author/Authors
N. Drouiche، نويسنده , , N. Ghaffour، نويسنده , , H. Lounici، نويسنده , , M. Mameri، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
7
From page
31
To page
37
Abstract
Treatment of chemical mechanical polishing (CMP) wastewater was investigated. The CMP wastewater, as obtained from surface treatment of photovoltaic wafers, was characterized by high suspended solids, high nephelometric turbidity unit (NTU), chemical oxygen demand (COD) and green color. This study determines the feasibility of CMP wastewater treatment by the electrocoagulation process. The COD concentration of the CMP wastewater was found in the range of 700 mg/l which is below the discharge standards. The analysis of the wastewater before and after electrocoagulation shows that the electrochemical process was a total barrier for the metal species, color and a significant reduction in the concentration of the fluoride and sulfate ions.
Keywords
Wafer , Electrocoagulation , Chemical mechanical polishing wastewater
Journal title
Desalination
Serial Year
2007
Journal title
Desalination
Record number
1111058
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