Title of article
Characteristics of α-SiC: H films produced by the r.f. plasma pulsed deposition method — Effect of deposition temperature
Author/Authors
H. Yamada، نويسنده , , O. Tsuji، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 1998
Pages
1
From page
1874
To page
1874
Journal title
Carbon
Serial Year
1998
Journal title
Carbon
Record number
1117788
Link To Document