Mechanical properties of ion beam deposited carbon films Original Research Article

Carbon films have been formed by direct ion beam deposition. In all experiments crystalline n-Si 〈1 0 0〉 wafers have been used as substrates. Mechanical stress of the films was measured using laser interferometry. Chemical structure of the carbon films was investigated using Raman spectroscopy. Residual stress increase (from 0.118 GPa to nearly 0.4 GPa) with the deposition temperature was observed. Correlation between the stress level and phase composition of thin film was revealed. It is shown that deposition at high temperature brings to the formation of the polymer-like carbon films and higher residual level stress. Nitrogen doping resulted in the formation of the more graphitic coatings and decreased stress level.