Title of article
Direct growth of few layer graphene on hexagonal boron nitride by chemical vapor deposition Original Research Article
Author/Authors
Xuli Ding، نويسنده , , Guqiao Ding، نويسنده , , Xiaoming Xie، نويسنده , , Fuqiang Huang، نويسنده , , Mianheng Jiang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
4
From page
2522
To page
2525
Abstract
Few layer graphene was grown on hexagonal boron nitride single crystal flakes by chemical vapor deposition without using metal catalysts. High quality and thickness controllability of the graphene layers are confirmed by Raman spectroscopy and transmission electron microscopy. Chemical vapor deposition of graphene on this perfect-lattice-matching dielectric substrate offers many advantages including cost effectiveness, easy scalability and compatibility with standard intergraded circuit processes and promises an advance to graphene’s applications in microelectronics and optoelectronics.
Journal title
Carbon
Serial Year
2011
Journal title
Carbon
Record number
1123320
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