Fabrication of patterned carbon nanotube thin films using electrophoretic deposition and ultrasonic radiation

A simple wet-deposition method for preparing patterned carbon nanotube (CNT) thin films is reported. Using electrophoretic deposition (EPD), CNTs were deposited over indium tin oxide (ITO) plates that had been patterned with a photoresist; consequently, CNTs covered not only the exposed ITO areas but also the photoresist areas because thinness of the photoresists could not prevent the transverse deposition of CNTs over the photoresist areas. The ultrasonic treatment for the samples removed only CNTs on the photoresist areas, resulting in the formation of patterned CNT thin films, because Ni metal formed during EPD connects CNTs to ITO plates.