Author/Authors :
Yuanwen Wu، نويسنده , , Guanghui Yu، نويسنده , , Haomin Wang، نويسنده , , Bin Wang، نويسنده , , Zhiying Chen and Jiaqiang Ding، نويسنده , , Yanhui Zhang، نويسنده , , Bin Wang، نويسنده , , Xiaoping SHI، نويسنده , , Xiaoming Xie، نويسنده , , Zhi Jin، نويسنده , , Xinyu Liu، نويسنده ,
Abstract :
We report the synthesis of large-area graphene films on Mo foils by chemical vapor deposition. X-ray diffraction indicates that the dissolution and segregation process governs the growth of graphene on Mo foils. Among all processing parameters investigated, the cooling rate is the key one to precisely control the thickness of graphene film. By optimizing the cooling rate between 1.5 and 10 °C/s, we managed to achieve graphene films ranging from mono- to tri-layer. Their uniformity and thickness were confirmed by Raman spectroscopy and optical measurements. The carrier mobility of films reaches as high as 193 cm2 V−1 s−1. Our experiments show that the Mo substrate has the similar simplicity and large tolerance to processing conditions as Cu.