Title of article
Chemical analysis of graphene oxide films after heat and chemical treatments by X-ray photoelectron and Micro-Raman spectroscopy Original Research Article
Author/Authors
Dongxing Yang، نويسنده , , Aruna Velamakanni، نويسنده , , Gülay Bozoklu، نويسنده , , Sungjin Park، نويسنده , , Meryl Stoller، نويسنده , , Richard D. Piner، نويسنده , , Sasha Stankovich، نويسنده , , Inhwa Jung، نويسنده , , Daniel A. Field، نويسنده , , Carl A. Ventrice Jr.، نويسنده , , Rodney S. Ruoff، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2009
Pages
8
From page
145
To page
152
Abstract
Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C
Journal title
Carbon
Serial Year
2009
Journal title
Carbon
Record number
1125866
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