Author/Authors :
Dongxing Yang، نويسنده , , Aruna Velamakanni، نويسنده , , Gülay Bozoklu، نويسنده , , Sungjin Park، نويسنده , , Meryl Stoller، نويسنده , , Richard D. Piner، نويسنده , , Sasha Stankovich، نويسنده , , Inhwa Jung، نويسنده , , Daniel A. Field، نويسنده , , Carl A. Ventrice Jr.، نويسنده , , Rodney S. Ruoff، نويسنده ,
Abstract :
Several nanometer-thick graphene oxide films deposited on silicon nitride-on silicon substrates were exposed to nine different heat treatments (three in Argon, three in Argon and Hydrogen, and three in ultra-high vacuum), and also a film was held at 70 °C
