Author/Authors :
Illayathambi Kunadian، نويسنده , , Rodney Andrews، نويسنده , , Dali Qian، نويسنده , , M. Pinar Mengüç، نويسنده ,
Abstract :
Unlike two-step chemical vapor deposition (CVD) methods using pre-deposited catalyst particles, in a continuous-feed CVD process, the liquid feed (consisting of catalytic precursor and hydrocarbon source) is continuously supplied into the reactor causing
