Author/Authors :
. Fanaei S، .T نويسنده Electrical and Electronic Department, University of Sistan and Baluchestan, Zahedan, I.R.Iran , , Zahed، .B نويسنده Mechanical Engineering Department, University of Sistan and Baluchestan, Zahedan, I.R. Iran , , Behzadmehr، .A نويسنده Mechanical Engineering Department, University of Sistan and Baluchestan, Zahedan, I.R. Iran , , Ateshi، .H نويسنده Chemical Engineering Department, University of Sistan and Baluchestan, Zahedan, I.R. Iran ,
Abstract :
Chemical Vapor Deposition (CVD) is one of the most popular methods for producing Carbon Nanotubes (CNTs). The growth rate of CNTs based on CVD technique is investigated by using a numerical model based on finite volume method. Inlet gas mixture, including xylene as carbon source and mixture of argon and hydrogen as carrier gas enters into a horizontal CVD reactor at atmospheric pressure. In this article the operating pressure variations are studied as the effective parameter on CNT growth rate and length uniformity.
