• Title of article

    Atomic structural environment of Y in the residual glass phase of silicon nitride and α-sialon Original Research Article

  • Author/Authors

    C.M. Wang، نويسنده , , M Mitomo، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2002
  • Pages
    8
  • From page
    3153
  • To page
    3160
  • Abstract
    The atomic structural environments around Y ions in the residual glass phase of Si3N4 and α-sialon densified with Y2O3 and Al2O3 have been investigated using extended X-ray absorption fine structure (EXAFS). In the residual glass phase, on average, the Y–O/N nearest neighbor bond length is determined to be 2.30 Å, which corresponds to the Y–O bond length in cubic Y2O3, indicating that O is the dominant nearest neighbor of Y. The fitted apparent Y–O/N nearest neighbor coordination number is ~4, which is apparently lower than that when Y is dissolved in a bulk glass, indicating that Y occupies substitutional Si sites. It is also further suggested that the Y–O/N polyhedron in the residual glass phase in silicon nitride and α-sialon is more distorted in comparison with that when Y is dissolved in a bulk glass phase.
  • Keywords
    Silicon nitride , EXAFS , Sialon , Y2O3
  • Journal title
    ACTA Materialia
  • Serial Year
    2002
  • Journal title
    ACTA Materialia
  • Record number

    1139964