• Title of article

    Microstructure and nanoindentation hardness of Al/Al3Sc multilayers Original Research Article

  • Author/Authors

    M.A. Phillips، نويسنده , , B.M. Clemens، نويسنده , , W.D. Nix، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2003
  • Pages
    14
  • From page
    3171
  • To page
    3184
  • Abstract
    In the present paper, we discuss the fabrication, characterization and mechanical properties of a unique multilayer system constructed of aluminum and scandium. Thin film deposition techniques have been used to create high-quality polycrystalline multilayered films consisting of inherently soft Al layers (6–100 nm thick) separated by thin (0.5–5 nm) layers of Al3Sc. We use X-ray diffraction, transmission electron microscopy and in situ wafer curvature to characterize the microstructure and intermixing of the Al/Al3Sc multilayer films produced by sputter deposition for this work. The accompanying hardness results show that layering with nanoscale coherent Al3Sc layers increases the hardness by between 200 and 500% over that of a pure aluminum film.
  • Keywords
    Hardness , Transmission electron microscopy (TEM) , Multilayer thin films , X-ray diffraction (XRD) , Nanoindentation
  • Journal title
    ACTA Materialia
  • Serial Year
    2003
  • Journal title
    ACTA Materialia
  • Record number

    1140371