Title of article
Microstructure and nanoindentation hardness of Al/Al3Sc multilayers Original Research Article
Author/Authors
M.A. Phillips، نويسنده , , B.M. Clemens، نويسنده , , W.D. Nix، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2003
Pages
14
From page
3171
To page
3184
Abstract
In the present paper, we discuss the fabrication, characterization and mechanical properties of a unique multilayer system constructed of aluminum and scandium. Thin film deposition techniques have been used to create high-quality polycrystalline multilayered films consisting of inherently soft Al layers (6–100 nm thick) separated by thin (0.5–5 nm) layers of Al3Sc. We use X-ray diffraction, transmission electron microscopy and in situ wafer curvature to characterize the microstructure and intermixing of the Al/Al3Sc multilayer films produced by sputter deposition for this work. The accompanying hardness results show that layering with nanoscale coherent Al3Sc layers increases the hardness by between 200 and 500% over that of a pure aluminum film.
Keywords
Hardness , Transmission electron microscopy (TEM) , Multilayer thin films , X-ray diffraction (XRD) , Nanoindentation
Journal title
ACTA Materialia
Serial Year
2003
Journal title
ACTA Materialia
Record number
1140371
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