• Title of article

    Relaxation of a disclinated tricrystalline nanowire Original Research Article

  • Author/Authors

    K. Zhou، نويسنده , , H.Y. Wang and M.S. Wu، نويسنده , , A.A. Nazarov، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2008
  • Pages
    9
  • From page
    5828
  • To page
    5836
  • Abstract
    Adjoining grains meeting at triple junctions generally suffer from misorientation mismatch, giving rise to disclinations in polycrystalline materials. This paper presents molecular dynamics simulations of the relaxation of a wedge disclination at the triple junction of a tricrystalline cobalt nanowire between 0 and 1200 K. The results show that complex relaxed structures can occur, including cracks and cavities, distorted grain boundaries, dislocations, twin bands, diffuse dislocation walls and amorphized zones, many of which have been observed in nanocrystalline metals. The realized structures depend on the nanowire size, temperature, disclination strength and grain boundary structures. Furthermore, there exists a critical disclination strength below which the disclination is stable and above which it relaxes via competing mechanisms. The critical disclination strength demonstrates a strong size effect at all temperatures.
  • Keywords
    Triple junction , Disclination , Relaxation mechanism , Nanowire
  • Journal title
    ACTA Materialia
  • Serial Year
    2008
  • Journal title
    ACTA Materialia
  • Record number

    1143941