Title of article :
Simulations of faceted polycrystalline thin films: Asymptotic analysis Original Research Article
Author/Authors :
Colin Ophus، نويسنده , , Erik Luber، نويسنده , , David Mitlin، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Pages :
10
From page :
1327
To page :
1336
Abstract :
We have used a level set construction to simulate the growth of faceted polycrystalline thin films in 2 + 1 dimensions using the van der Drift model. The evolution of several different crystal geometries into their self-similar late-stage surfaces is described. Each simulation resulted in a columnar microstructure and growth statistics including grain diameter and area, RMS surface roughness and surface texture were collected at each time step. We describe the dependence of each of these statistical measures upon the crystal geometry.
Keywords :
Thin film growth , computer simulation , Grain morphology , Chemical vapor deposition
Journal title :
ACTA Materialia
Serial Year :
2009
Journal title :
ACTA Materialia
Record number :
1144120
Link To Document :
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