Title of article :
Magnetic properties and their dependence on deposition parameters of Co/Al2O3 multilayers grown by pulsed laser deposition Original Research Article
Author/Authors :
Ravi Aggarwal، نويسنده , , Sudhakar Nori، نويسنده , , Chunming Jin، نويسنده , , Punam Pant، نويسنده , , Gopinath R. Trichy، نويسنده , , Dhananjay Kumar، نويسنده , , J. Narayan، نويسنده , , Roger J. Narayan، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2009
Abstract :
Co/Al2O3 multilayered thin films were grown on Si (111) substrates by pulsed laser deposition (PLD) at temperatures from room temperature (RT) to 600 °C. The Co/Al2O3 multilayered thin film grown at RT contains continuous cobalt layers in alumina matrices, with no evidence of island formation. On the other hand, cobalt showed a tendency to form islands in alumina matrices for growth temperatures in the range of 300–600 °C. All the Co/Al2O3 multilayered thin films showed ferromagnetic behavior up to RT. It was observed that variations in the deposition parameters can significantly influence the magnetic properties of Co/Al2O3 multilayers. Depending on the temperature and pulse rate, RT coercivities in the 50–300 Oe range were observed. Films deposited at 600 °C using a laser pulse rate of 10 Hz exhibited a decrease of coercivity with increasing measurement temperature. On the other hand, films deposited at 600 °C using a reduced pulse rate of 2 Hz demonstrated an “anomalous” relationship between low-temperature coercivity and temperature. In these films, coercivity exhibited a weak tendency to increase with temperature. Squareness (Mr/Ms) of the hysteresis loops and its dependence on the temperature was also shown to be strongly affected by the deposition parameters. These observations have been rationalized on the basis of two competing magnetic anisotropies that act along different directions in the material.
Keywords :
Magnetic properties , Pulsed laser deposition , Multilayered materials , Thin films
Journal title :
ACTA Materialia
Journal title :
ACTA Materialia