Title of article
High temperature oxidation of Mo–Si–B alloys: Effect of low and very low oxygen partial pressures Original Research Article
Author/Authors
Steffen Burk، نويسنده , , Bronislava Gorr، نويسنده , , Hans-Jürgen Christ، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2010
Pages
12
From page
6154
To page
6165
Abstract
The oxidation mechanism of a Mo–Si–B alloy in two different oxygen partial pressure ranges was investigated between 820 and 1200 °C. Oxygen partial pressures between 10−19 and 10−12 bar were applied in order to suppress Mo oxide formation. Weight gain kinetics were determined resulting from simultaneous external and internal oxidation. Silica scale formation was found to lead to a droplet shape because of the high evaporation rates of B2O3 and limited wetting of the silica. In the oxygen partial pressure range 10−6–10−4 bar Mo–Si–B alloys suffer from severe degradation due to continuous formation of volatile MoO3. Catastrophic oxidation was observed as a consequence of the formation of a highly porous and non-protective silica scale.
Keywords
Thermodynamic modelling , Boron , Silicon , Intermetallic compounds , Oxidation
Journal title
ACTA Materialia
Serial Year
2010
Journal title
ACTA Materialia
Record number
1145197
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