• Title of article

    Quantitative analysis of stress-induced martensites by in situ transmission electron microscopy superelastic tests in Cu–Al–Ni shape memory alloys Original Research Article

  • Author/Authors

    M.L. N?، نويسنده , , A. Ibarra، نويسنده , , D. Caillard، نويسنده , , J. San Juan، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2010
  • Pages
    13
  • From page
    6181
  • To page
    6193
  • Abstract
    Stress-induced martensite nucleation and further growing, in Cu–Al–Ni shape memory alloys, have been studied during in situ superelastic tests in the transmission electron microscope. Two kinds of martensite, image and image, are induced and can coexist under stress, both exhibiting in a high density of stacking faults. The interface plane and the orientation relationships between the different variants of such martensites have been determined, and the atomic configurations of the lattices across the interface have been described. Finally, in light of the results, selection rules for the stress-induced promoted martensites at the nano-scale have been established, being determined by the shear direction and the basal plane of the martensite lattice.
  • Keywords
    Shape memory alloys , Electron diffraction , Superelastic effect , Interfaces , Transmission electron microscopy
  • Journal title
    ACTA Materialia
  • Serial Year
    2010
  • Journal title
    ACTA Materialia
  • Record number

    1145200