Title of article :
Sputter-deposited Cu/Cu(O) multilayers exhibiting enhanced strength and tunable modulus Original Research Article
Author/Authors :
J.P. Chu، نويسنده , , Y.-C. Wang، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2010
Pages :
8
From page :
6371
To page :
6378
Abstract :
By means of brief pauses in radiofrequency (RF) sputter deposition between individual layers, ultrathin copper oxide layers were formed through adsorption in the Cu/Cu multilayers. Their mechanical properties were compared with the Cu/Cu(O) multilayers whose oxide layers were deliberately deposited between copper layers. The mechanical hardness value of the Cu/Cu(O) multilayers approached that of nanostructured copper thin films. The Young’s modulus of the multilayers was tunable, in accordance with the elasticity theories of composites. In addition, the Hall–Petch slope of the RF sputter-deposited Cu monolayers indicated that their theoretical strength approached the shear modulus of copper.
Keywords :
Sputtering deposition , Multilayer thin film , AES , Nanoindentation , Secondary ion mass spectroscopy
Journal title :
ACTA Materialia
Serial Year :
2010
Journal title :
ACTA Materialia
Record number :
1145219
Link To Document :
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