Title of article
Quantitative strain analysis and growth mode of pulsed laser deposited epitaxial CoFe2O4 thin films Original Research Article
Author/Authors
Anna-Karin Axelsson، نويسنده , , Frederic Aguesse، نويسنده , , Liam Spillane، نويسنده , , Matjaz Valant، نويسنده , , David W. McComb، نويسنده , , Neil McN. Alford، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2011
Pages
7
From page
514
To page
520
Abstract
A microstructural investigation of epitaxial CoFe2O4 films grown by pulsed laser deposition on single crystal SrTiO3 substrates was performed. We quantitatively analysed the microscopic mechanisms for structural mismatch compensation and the mode of the film growth. X-ray diffraction revealed very low microstrain in all three crystallographic directions of the film, which together with the lattice strain is not large enough to compensate effectively for the mismatch. Quantitative high-resolution transmission electron microscopy showed that most of the compensation occurs by formation of (4 0 0) edge dislocations in the film. These dislocations are concentrated within a critical layer above which a change from layer-by-layer growth to island growth was observed. These observations closely correspond to characteristics of the Stranski–Krastanov growth mode. Atomic force microscopy studies confirmed that during the post-annealing long-range mass diffusion takes place, which facilitates the relaxation of the microstrain during this treatment.
Keywords
Interfaces , Strain , Cobalt ferrite , Thin film , Pulsed laser deposition
Journal title
ACTA Materialia
Serial Year
2011
Journal title
ACTA Materialia
Record number
1145319
Link To Document