Title of article
Diffusion-induced recrystallization in nickel/palladium multilayers Original Research Article
Author/Authors
M. Kasprzak، نويسنده , , D. Baither، نويسنده , , G. Schmitz، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2011
Pages
8
From page
1734
To page
1741
Abstract
In size-mismatched thin film interdiffusion couples diffusion-induced recrystallization (DIR) occurs rather than conventional Fickian atomic transport. Grains formed in this process have characteristic composition levels that are so far not understood. In this work, DIR is studied in sputter-deposited Ni/Pd films. By pre-alloying one side of the diffusion couple, the mismatch, and thus the driving force, are varied. After heat treatment, transmission electron microscopy, energy-dispersive X-ray spectroscopy and X-ray diffractometry demonstrate recrystallization. Characteristic concentration levels are derived from X-ray diffraction data. Remarkably, the concentration inside newly formed grains shifts coherently to the concentration inside the parent layers. We demonstrate that the observed concentration levels are in agreement with a recently published thermomechanical model.
Keywords
Metallic thin films , Diffusion-induced recrystallization , X-ray diffraction (XRD) , Ideal shear strength , NiPd
Journal title
ACTA Materialia
Serial Year
2011
Journal title
ACTA Materialia
Record number
1145441
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