Author/Authors :
Y. El Gmili، نويسنده , , G. Orsal، نويسنده , , K. Pantzas، نويسنده , , T. Moudakir، نويسنده , , S. Sundaram، نويسنده , , G. PATRIARCHE، نويسنده , , J. Hester، نويسنده , , A. Ahaitouf، نويسنده , , J.P. Salvestrini، نويسنده , , A. Ougazzaden، نويسنده ,
Abstract :
We report a comparison of the morphological, structural and optical properties of both InGaN single-layer and multilayered structures, the latter consisting of periodic thin GaN interlayers inserted during InGaN growth. It is shown that such a structure suppresses the In concentration fluctuations and corresponding different states of strain relaxation with depth, both detrimental to solar cell applications. Measurements performed by X-ray diffraction, cathodoluminescence and photoluminescence demonstrate that this multilayer growth is a promising approach to increase both the InGaN layer total thickness and In content in InGaN epilayers. As an example, single-phase 120 nm thick InGaN with 14.3% In content is obtained and found to possess high structural quality.
Keywords :
Semiconductor materials , Multilayer design , Deposition and fabrication , Thin films , InGaN