• Title of article

    An apparatus for performing microtensile tests at elevated temperatures inside a scanning electron microscope

  • Author/Authors

    Gi-Dong Sim، نويسنده , , Jun-Hyub Park، نويسنده , , Michael D. Uchic، نويسنده , , Paul A. Shade، نويسنده , , Soon-Bok Lee، نويسنده , , Joost J. Vlassak، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2013
  • Pages
    11
  • From page
    7500
  • To page
    7510
  • Abstract
    In this paper, we introduce an apparatus to perform microtensile tests at elevated temperatures inside a scanning electron microscope. The apparatus has a stroke of 250 μm with a displacement resolution of 10 nm and a load resolution of 9.7 μN. Measurements at elevated temperatures are performed through use of two silicon-based micromachined heaters that support the sample. Each heater consists of a tungsten heating element that also serves as a temperature gauge. To demonstrate the testing capabilities, tensile tests were performed on submicron Cu films at various temperatures up to 430 °C. Stress–strain curves show a significant decrease in yield strength and initial slope for the samples tested at elevated temperature, which we attribute to diffusion-facilitated grain boundary sliding and dislocation climb.
  • Keywords
    In situ tension test , Thin film , Creep , Grain boundary sliding , High-temperature deformation
  • Journal title
    ACTA Materialia
  • Serial Year
    2013
  • Journal title
    ACTA Materialia
  • Record number

    1147355