Title of article
An apparatus for performing microtensile tests at elevated temperatures inside a scanning electron microscope
Author/Authors
Gi-Dong Sim، نويسنده , , Jun-Hyub Park، نويسنده , , Michael D. Uchic، نويسنده , , Paul A. Shade، نويسنده , , Soon-Bok Lee، نويسنده , , Joost J. Vlassak، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2013
Pages
11
From page
7500
To page
7510
Abstract
In this paper, we introduce an apparatus to perform microtensile tests at elevated temperatures inside a scanning electron microscope. The apparatus has a stroke of 250 μm with a displacement resolution of 10 nm and a load resolution of 9.7 μN. Measurements at elevated temperatures are performed through use of two silicon-based micromachined heaters that support the sample. Each heater consists of a tungsten heating element that also serves as a temperature gauge. To demonstrate the testing capabilities, tensile tests were performed on submicron Cu films at various temperatures up to 430 °C. Stress–strain curves show a significant decrease in yield strength and initial slope for the samples tested at elevated temperature, which we attribute to diffusion-facilitated grain boundary sliding and dislocation climb.
Keywords
In situ tension test , Thin film , Creep , Grain boundary sliding , High-temperature deformation
Journal title
ACTA Materialia
Serial Year
2013
Journal title
ACTA Materialia
Record number
1147355
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