Title of article :
An apparatus for performing microtensile tests at elevated temperatures inside a scanning electron microscope
Author/Authors :
Gi-Dong Sim، نويسنده , , Jun-Hyub Park، نويسنده , , Michael D. Uchic، نويسنده , , Paul A. Shade، نويسنده , , Soon-Bok Lee، نويسنده , , Joost J. Vlassak، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2013
Pages :
11
From page :
7500
To page :
7510
Abstract :
In this paper, we introduce an apparatus to perform microtensile tests at elevated temperatures inside a scanning electron microscope. The apparatus has a stroke of 250 μm with a displacement resolution of 10 nm and a load resolution of 9.7 μN. Measurements at elevated temperatures are performed through use of two silicon-based micromachined heaters that support the sample. Each heater consists of a tungsten heating element that also serves as a temperature gauge. To demonstrate the testing capabilities, tensile tests were performed on submicron Cu films at various temperatures up to 430 °C. Stress–strain curves show a significant decrease in yield strength and initial slope for the samples tested at elevated temperature, which we attribute to diffusion-facilitated grain boundary sliding and dislocation climb.
Keywords :
In situ tension test , Thin film , Creep , Grain boundary sliding , High-temperature deformation
Journal title :
ACTA Materialia
Serial Year :
2013
Journal title :
ACTA Materialia
Record number :
1147355
Link To Document :
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