Title of article :
Stability and migration of charged oxygen interstitials in ThO2 and CeO2
Author/Authors :
H.Y. Xiao، نويسنده , , Y. Zhang، نويسنده , , W.J. Weber، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2013
Pages :
7
From page :
7639
To page :
7645
Abstract :
Density functional theory calculations have been carried out to study the stability and migration of charged oxygen interstitials in ThO2 and CeO2. The calculations demonstrate that the oxygen interstitial is likely to lose electrons under p-type conditions and gain electrons under n-type conditions. Neutral image and singly positive image O–O〈1 1 0〉 split interstitials, and doubly negative octahedral (image) oxygen interstitial are found to be the lowest-energy configurations within a certain Fermi energy range. In both oxides, the image is the most mobile, and the migration energies of the split oxygen interstitials in ThO2 are lower than in CeO2, indicating higher oxygen interstitial mobility in ThO2 than in CeO2.
Keywords :
Stability and migration , Oxygen interstitial , Charged defect , DFT
Journal title :
ACTA Materialia
Serial Year :
2013
Journal title :
ACTA Materialia
Record number :
1147367
Link To Document :
بازگشت