Title of article
Towards atomic level vanadium doping of TiO2 via liquid-phase atomic layer deposition Original Research Article
Author/Authors
Yaodong Shen، نويسنده , , Thelese R.B. Foong، نويسنده , , Xiao Hu، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2011
Pages
4
From page
87
To page
90
Abstract
Vanadium-doping of TiO2 at the atomic level was achieved via a liquid phase atomic layer deposition (L-ALD) method. UV–vis absorption edge of vanadium-doped TiO2 has been red-shifted ∼55 nm into visible light region. Photocatalytical assessment reveals that the degradation rate of methylene blue (MB) for vanadium-doped TiO2 under visible light illumination was enhanced by up to 500% compared to the undoped TiO2. This improvement was believed to be attributed to the atomic level doping of the L-ALD method.
Keywords
Atomic force microscopy (AFM) , Atomic layer epitaxy , Crystalline oxide
Journal title
Applied Catalysis A:General
Serial Year
2011
Journal title
Applied Catalysis A:General
Record number
1156619
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