Electrical resistivity studies of thermally evaporated manganese–rhenium thin films Original Research Article

Electrical resistivity studies have been carried out on thermally evaporated Mn100−xRex thin films (with X=0.1–0.5 and 1 at.% Re) over the temperature range from 300 to 1.4 K using the van der Pauw four probe technique. A resistivity minimum a notable characteristic of α-Mn was found in all the specimens with a shift of Tmin corresponding to the resistivity minimum to upper values as the concentration of Re increases. The results show a tendency towards saturation of the resistivity as the temperature approaches zero implying a Kondo scattering mechanism in the samples. The shift of Tmin and the characteristic Kondo temperature TK to upper values may be explained in terms of the Kondo scattering.