• Title of article

    Modeling of harmonic contributions to non-symmetrical RF plasmas

  • Author/Authors

    M.N.A. Dewan، نويسنده , , Patrick J. McNally، نويسنده , , P.A.F. Herbert، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2001
  • Pages
    7
  • From page
    343
  • To page
    349
  • Abstract
    An analytical solution for the harmonic contributions to the dynamics of an asymmetrically driven capacitively coupled plasma is obtained under the assumptions of time-independent, collisionless ion motion, inertialess electrons and uniform current density. Modeling is performed considering the effect of an arbitrary Nth harmonic sinusoidal current. The overall effect is determined by summing up the effects due to all the current harmonics. The expressions for the instantaneous and time averaged electric field within the sheath, the non-linear oscillation motion of the electron sheath boundary, the effective sheath impedance, the bulk plasma impedance and finally the overall plasma impedance are obtained. Experimental results are shown to be in good qualitative agreement with the theoretical model.
  • Keywords
    Plasma modeling , Reactive ion etching , Plasma impedance monitor
  • Journal title
    Journal of Materials Processing Technology
  • Serial Year
    2001
  • Journal title
    Journal of Materials Processing Technology
  • Record number

    1176404