Numerical study of photolithography system: electromagnetic differential method

The R-matrix propagation algorithm is incorporated into the differential method to achieve an extended capability for modelling a photolithography systems. We show throughout this work the ability of the R-matrix algorithm and differential method to analyse gratings of arbitrary depth, profile, and conductivity without encountering numerical instabilities. We calculate the field intensity and the transmitted amplitudes in the 0 and −1 orders below different masks. We study also the influence of the various parameters (incidence, groove spacing, groove depth and index of refraction) on the field intensity maps and the transmittivity power. These results agree with the experimental patent: we can duplicate the periodic masks as well as aperiodic masks.