Atomic force microscopy-based nano-lithography for nano-patterning: a molecular dynamic study

The atomic force microscopy (AFM)-based nano-lithographic technique is currently used to directly machine material surfaces and fabricate nano-components for MEMS device. In the current study, three-dimensional molecular dynamic (MD) simulations with potentials based on the Morse function were performed to evaluate the effect of crystallographic factors and process variables on the nano-deformation characteristics of the nano-lithography process of monocrystalline copper. Moreover, the effects of process variables (the tool shape, cutting speed and undeformed chip thickness) on the nano-structural pattern are investigated. The simulation results revealed that the crystal orientation and ploughing direction had a significant influence on varying the forces (cutting force, thrust force, and width-direction force) as well as the nature of the nano-deformation ahead of the tool and surface quality of the machined material.