Title of article :
Monte Carlo simulation of laser and plasma nitriding titanium
Author/Authors :
Hanjiang Yu، نويسنده , , Fengjiu Sun، نويسنده , , Junyou Liu *، نويسنده , , Jun Zhang، نويسنده , , Yongcun Yang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2009
Abstract :
By means of Monte Carlo (MC), the process of the nitrogen ion implanting in the titanium was simulated, which occurred during the nitriding titanium by laser and plasma nitriding (LPN). The nitrogen ion distribution in the titanium, the biggest penetration depth, and the thickness of the nitriding layer were calculated at different laser power density. Under the conditions, P0 = 1.0 × 106 W/cm2 (laser power density) and image (scanning velocity), the simulated results were in good agreement with the corresponding experimental results. The simulations predicted that, when image and 2.0 × 105 W/cm2 ≤ P0 ≤ 1.0 × 106 W/cm2, the penetration depth increased with the laser power density increasing. A better nitriding effect could be obtained when the laser power density was higher than 8.0 × 105 W/cm2.
Keywords :
Laser and plasma nitriding , Monte Carlo simulation , Titanium nitride
Journal title :
Journal of Materials Processing Technology
Journal title :
Journal of Materials Processing Technology