Title of article
Modification of polysulfone membranes 4. Ammonia plasma treatment
Author/Authors
Marek Bryjak، نويسنده , , Irena Gancarz، نويسنده , , Gryzelda Pozniak، نويسنده , , Wlodzimierz Tylus، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
10
From page
717
To page
726
Abstract
The effect of NH3 and NH3/Ar plasma on ultrafiltration polysulfone membranes have been studied. Results of contact angle, FTIR–ATR and X-ray photoelectron spectroscopy experiments clearly showed that both plasmas introduced hydrophilic, nitrogen- and oxygen-containing moieties on the polymer surface and that NH3/Ar plasma was more efficient. That plasma was also more aggressive––signs of strong etching could be seen on the SEM pictures. Redeposition of etched material seemed to take place inside the pores. On the contrary, ammonia plasma was soft and caused cleaning the surface and pores enlargement. Performance of ammonia plasma modified membranes was greatly improved and independent on solution pH. The last observation proved amphoteric character of the surface. NH3/Ar plasma treatment gave membranes of acidic surface and filtration indices not so good as for ammonia plasma.
Keywords
Ultrafiltration , Surface Analysis , Membrane structure , microwave plasma
Journal title
European Polymer Journal(EPJ)
Serial Year
2002
Journal title
European Polymer Journal(EPJ)
Record number
1211682
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