Title of article :
Modification of polysulfone membranes 4. Ammonia plasma treatment
Author/Authors :
Marek Bryjak، نويسنده , , Irena Gancarz، نويسنده , , Gryzelda Pozniak، نويسنده , , Wlodzimierz Tylus، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2002
Abstract :
The effect of NH3 and NH3/Ar plasma on ultrafiltration polysulfone membranes have been studied. Results of contact angle, FTIR–ATR and X-ray photoelectron spectroscopy experiments clearly showed that both plasmas introduced hydrophilic, nitrogen- and oxygen-containing moieties on the polymer surface and that NH3/Ar plasma was more efficient. That plasma was also more aggressive––signs of strong etching could be seen on the SEM pictures. Redeposition of etched material seemed to take place inside the pores. On the contrary, ammonia plasma was soft and caused cleaning the surface and pores enlargement. Performance of ammonia plasma modified membranes was greatly improved and independent on solution pH. The last observation proved amphoteric character of the surface. NH3/Ar plasma treatment gave membranes of acidic surface and filtration indices not so good as for ammonia plasma.
Keywords :
Ultrafiltration , Surface Analysis , Membrane structure , microwave plasma
Journal title :
European Polymer Journal(EPJ)
Journal title :
European Polymer Journal(EPJ)