Title of article :
Surface structure of thin asymmetric PS-b-PMMA diblock copolymers investigated by atomic force microscopy
Author/Authors :
A.A. Khaydarov، نويسنده , , I.W. Hamley، نويسنده , , Thomas M. Legge، نويسنده , , Sebastien Perrier، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2007
Pages :
8
From page :
789
To page :
796
Abstract :
Asymmetric poly(styrene-b-methyl methacrylate) (PS-b-PMMA) diblock copolymers of molecular weight Mn = 29,700 g mol−1 (MPS = 9300 g mol−1 MPMMA = 20,100 g mol−1, PD = 1.15, χPS = 0.323, χPMMA = 0.677) and Mn = 63,900 g mol−1 (MPS = 50,500 g mol−1, MPMMA = 13,400 g mol−1, PD = 1.18, χPS = 0.790, χPMMA = 0.210) were prepared via reversible addition-fragmentation chain transfer (RAFT) polymerization. Atomic force microscopy (AFM) was used to investigate the surface structure of thin films, prepared by spin-coating the diblock copolymers on a silicon substrate. We show that the nanostructure of the diblock copolymer depends on the molecular weight and volume fraction of the diblock copolymers. We observed a perpendicular lamellar structure for the high molar mass sample and a hexagonal-packed cylindrical patterning for the lower molar mass one. Small-angle X-ray scattering investigation of these samples without annealing did not reveal any ordered structure. Annealing of PS-b-PMMA samples at 160 °C for 24 h led to a change in surface structure.
Keywords :
block copolymers , RAFT , Thin films , AFM , PS-b-PMMA
Journal title :
European Polymer Journal(EPJ)
Serial Year :
2007
Journal title :
European Polymer Journal(EPJ)
Record number :
1214643
Link To Document :
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