Title of article
Surface patterns of block copolymers in thin layers after vapor treatment
Author/Authors
Peter ?ernoch، نويسنده , , Petr Stepanek، نويسنده , , Josef Ple?til، نويسنده , , Miroslav Slouf، نويسنده , , Alexander Sidorenko، نويسنده , , Manfred Stamm، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2007
Pages
10
From page
1144
To page
1153
Abstract
A systematic study of formation of surface patterns in block copolymer thin layers after their exposure to solvent vapors was performed. The studied effect involves layers of thickness approximately equal to the ordering size of polymers – about 45 nm. Experiments were performed on three styrene – methacrylate derivative block copolymers, synthesized by living anionic polymerization: poly(4-octylstyrene)-block-poly(butyl methacrylate), poly(4-fluorostyrene)-block-poly(butyl methacrylate) and poly(p-octylstyrene)-block-poly(methyl methacrylate). The polymers were exposed to vapors of chloroform, 1,4-dioxane, hexane, acetone and tetrahydrofuran.
Keywords
block copolymers , Thin layers , Vapor treatment , SELF-ASSEMBLY
Journal title
European Polymer Journal(EPJ)
Serial Year
2007
Journal title
European Polymer Journal(EPJ)
Record number
1214736
Link To Document