• Title of article

    Electrochemical behaviour of alkaline copper complexes

  • Author/Authors

    MAYANNA، S. M. نويسنده , , MURALIDHARAN، V.S. نويسنده , , ARAVINDA، C.L. نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2000
  • Pages
    8
  • From page
    543
  • To page
    550
  • Abstract
    A search for non-cyanide plating baths for copper resulted in the development of alkaline copper complex baths containing trisodium citrate [TSC] and triethanolamine [TEA]. Voltammetric studies were carried out on platinum to understand the electrochemical behaviour of these complexes. In TSC solutions, the deposition of copper involves the slow formation of a monovalent species. Adsorption of this species obeys Langmuir isotherm. In TEA solutions the deposition involves the formation of monovalent ions obeying the non-activated Temkin isotherm. Conversion of divalent to monovalent copper is also slow. In TEA and TSC alkaline copper solutions, the predominant species that undergo stepwise reduction contain only TEA ligands.
  • Keywords
    Alkaline copper complexes , non-cyanide plating
  • Journal title
    Journal of Chemical Sciences
  • Serial Year
    2000
  • Journal title
    Journal of Chemical Sciences
  • Record number

    122256