Title of article
Structure sensitivity for NO dissociation on palladium and rhodium surfaces
Author/Authors
David Loffreda، نويسنده , , Daniel Simon، نويسنده , , Philippe Sautet، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2003
Pages
15
From page
211
To page
225
Abstract
We present a comparative density-functional theory study of the chemisorption and the dissociation of the NO molecule on the close-packed (111), the more open (100), and the stepped (511) surfaces of palladium and rhodium. The energetic and kinetic properties of the reaction pathways are reported. The structure sensitivity is correlated to the catalytic activity, which can be linked to the calculated dissociation rate constants at 300 K: Rh (100)⩾terrace Rh (511)>step Rh (511)>step Pd (511)>Rh (111)>Pd (100)⩾terrace Pd (511)>Pd (111). The effect of the steps on the activity is found to be clearly favorable for the Pd (511) surface and unfavorable for the Rh (511) surface. The reaction barriers are correlated to the stability of the final states and the geometries of the molecular precursor states.
Journal title
Journal of Catalysis
Serial Year
2003
Journal title
Journal of Catalysis
Record number
1222567
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