• Title of article

    Structure sensitivity for NO dissociation on palladium and rhodium surfaces

  • Author/Authors

    David Loffreda، نويسنده , , Daniel Simon، نويسنده , , Philippe Sautet، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2003
  • Pages
    15
  • From page
    211
  • To page
    225
  • Abstract
    We present a comparative density-functional theory study of the chemisorption and the dissociation of the NO molecule on the close-packed (111), the more open (100), and the stepped (511) surfaces of palladium and rhodium. The energetic and kinetic properties of the reaction pathways are reported. The structure sensitivity is correlated to the catalytic activity, which can be linked to the calculated dissociation rate constants at 300 K: Rh (100)⩾terrace Rh (511)>step Rh (511)>step Pd (511)>Rh (111)>Pd (100)⩾terrace Pd (511)>Pd (111). The effect of the steps on the activity is found to be clearly favorable for the Pd (511) surface and unfavorable for the Rh (511) surface. The reaction barriers are correlated to the stability of the final states and the geometries of the molecular precursor states.
  • Journal title
    Journal of Catalysis
  • Serial Year
    2003
  • Journal title
    Journal of Catalysis
  • Record number

    1222567