Direct ether formation of semibenzopinacol moieties in a photopolymerization system featured constant intensity of absorbed light

In a special photopolymerization reaction system, the reactivity of semibenzopinacol moieties was examined. Structural analysis by 1D/2D NMR showed that the hydroxyl groups of the semibenzopinacol moieties after hydrogen abstraction reaction have reacted directly to form a new ether structure instead of the cleavage of a C–C bond in a photopolymerization system featured constant intensity of absorbed light when there is only vinyl acetate added. In order to clarify this new reaction, comparative experiments and several characterization methods were applied. Results revealed that poly(vinyl acetate) radicals initiated by UV irradiation or benzophenone/triethanolamine system, and UV irradiation under or above 300 nm, were two necessary factors for the formation of the new ether structure from hydroxyl groups of semibenzopinacol moieties.