Title of article :
Kinetics of thiophene reactive adsorption on Ni/SiO2 and Ni/ZnO
Author/Authors :
Igor Bezverkhyy، نويسنده , , Andrey Ryzhikov، نويسنده , , Geoffroy Gadacz، نويسنده , , Jean-Pierre Bellat، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2008
Pages :
7
From page :
199
To page :
205
Abstract :
Kinetics of thiophene reactive adsorption on Ni/SiO2 and Ni/ZnO was studied by thermal gravimetric analysis at 280–360 °C under 5–40 mbar of thiophene in H2. In the case of Ni/SiO2 the interaction proceeds in two steps: a rapid surface reaction is followed by a slower bulk transformation into Ni3S2. Maximum Ni conversion depends on reaction conditions and observed conversion profiles can be described by an exponential equation corresponding to a reaction of first order relatively to both sulfidable Ni amount and thiophene. The interaction between Ni/ZnO and thiophene proceeds in a rather different manner. A rapid increase of weight, similar to the first stage observed on Ni/SiO2, is not followed by bulk Ni sulfidation, but instead by a nucleation-controlled ZnO surface transformation. After formation of the surface ZnS layer, a complete particles sulfidation occurs with kinetics being strongly dependent on the reaction conditions possibly due to comparable rates of different reaction steps.
Keywords :
Desulfurization , Supported Ni , Thiophene adsorption , Reactive adsorption
Journal title :
CATALYSIS TODAY
Serial Year :
2008
Journal title :
CATALYSIS TODAY
Record number :
1236228
Link To Document :
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