Title of article :
Tuning of charge carrier density of ZnO nanoparticle films by oxygen plasma treatment
Author/Authors :
S. Walther، نويسنده , , Christopher S. Polster، نويسنده , , M.P.M. Jank، نويسنده , , H. Thiem، نويسنده , , H. Ryssel، نويسنده , , Marsha L. Frey، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
4
From page :
253
To page :
256
Abstract :
In this work, the charge carrier density of ZnO nanoparticle films was modified after deposition and annealing by an oxygen plasma treatment. The respective films were utilized as active layers in thin film transistors. For a discussion of the plasma–surface interaction on the molecular level, the electrical behavior of the layers was investigated which in general is highly sensitive to low level variations in defect or doping densities. A treatment with remote oxygen plasma at 400 W for 10 s led to a shift of the turn-on voltage from −12 to 4 V and a reduction of the off-current by more than two orders of magnitude. A model for the influence of oxygen species adsorbed to ZnO nanoparticle surfaces on electrical characteristics of ZnO nanoparticle thin film transistors is introduced.
Keywords :
ZNO , Printed electronics , Plasma treatment , TFT
Journal title :
Advanced Powder Technology
Serial Year :
2011
Journal title :
Advanced Powder Technology
Record number :
1247848
Link To Document :
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