Title of article :
Dislocation shielding and flaw tolerance in titanium nitride
Author/Authors :
S. Kumar، نويسنده , , D.E. Wolfe، نويسنده , , M.A. Haque، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
9
From page :
739
To page :
747
Abstract :
Titanium nitride is a very brittle and flaw sensitive ceramic material at temperatures below 750 °C. In this study, we present experimental evidence of room temperature dislocation-based plasticity in the material as well as insensitivity to flaws in form of single edge notches. We performed in-situ fracture experiments inside the transmission electron microscope on 150–300 nm thick, 5 μ wide freestanding films fabricated from titanium nitride/titanium multi-layers with titanium nitride as the notched and titanium as un-notched layers. The calculated stress concentration factor for the 800 nm to 1.5 μ long notches were greater than 8, however, the terminal cracks always nucleated at the un-notched edge of the specimens and not at the notch tip. To explain such remarkable flaw tolerance, we observe motion of dislocations (pre-existing and nucleated away from the notch) towards the notch tip. We suggest that the room temperature dislocation activities are facilitated by the residual stresses in the multi-layer specimens and the thickness dependence of image forces, which reduces the effective shear modulus to promote dislocation motion. The migration of dislocations towards the notch tip shields it from stress concentration to manifest the flaw tolerance in 150 nm specimens, which is observed real time in the microscope.
Keywords :
fracture , Multi-layer thin films , Tension test , Transmission electron microscopy (TEM)
Journal title :
International Journal of Plasticity
Serial Year :
2011
Journal title :
International Journal of Plasticity
Record number :
1254984
Link To Document :
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