Title of article :
Enhancement of the non-photochemical hole-burning efficiency of a silicon naphthalocyanine in the presence of electron acceptor activators
Author/Authors :
Sébastien Fraigne، نويسنده , , James H. Rice، نويسنده , , Jean-Pierre Galaup، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2001
Abstract :
We report on persistent spectral hole burning (PSHB) in a silicon-naphthalocyanine doped poly-vinylbutyral film in the presence of electron acceptors such as citral or hexachloroethane. The hole-burning efficiency does not depend on the concentration in 1-color PSHB experiments. The hole growth kinetics reflects the dispersion of the burning rates connected to the distribution of tunnel parameters of the two-level systems coupled to the electronic state of the dye. In 2-color experiments, an increase of the efficiency by a factor 10 compared with 1-color results with no acceptor is achieved with green gating light, the largest increase being observed with C70 as an acceptor.
Keywords :
Electron acceptors , Silicon-naphthalocyanine , two-level systems , Fullerene , spectral hole burning , Photon gating
Journal title :
Journal of Luminescence
Journal title :
Journal of Luminescence