Low temperature deposition of SrS:Cu,F ACTFEL device by electron beam evaporation

Photoluminescence (PL) and electroluminescence (EL) of SrS:Cu,F alternating current thin film electroluminescent (ACTFEL) device prepared by electron beam/thermal multi-source evaporation are presented. The active layer was grown at 380 °C and neither post-deposition annealing nor sulphur co-evaporation was performed. Two bands at 380 and 435 nm were present in the PL spectrum, which are suggested to be due to donor acceptor recombination. EL spectrum consisted of an additional band at 535 nm, which is attributed to Cu+ intracenter emission. The device exhibited yellowish white EL emission with chromaticity coordinates x=0.25, y=0.27 and low threshold voltage.