Title of article :
Luminescence intensity and dopant concentration in AlN:Tb
Author/Authors :
Felix Benz، نويسنده , , Miao Yang، نويسنده , , Ye Weng، نويسنده , , Horst P. Strunk، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2012
Pages :
4
From page :
1493
To page :
1496
Abstract :
The luminescence intensity of Tb3+ embedded in sputter deposited and subsequently annealed AlN shows strong concentration dependence. The intensity of the characteristic green luminescence of Tb3+ rises at low concentrations with rising concentration. At higher concentrations, strong concentration quenching occurs. The optimum concentration range of Tb3+ in AlN was observed to range between 2.5 at% Tb and 3.6 at% Tb. The experimentally evaluated concentration dependence results can be described by a rate equation approach based on available models of luminescence quenching.
Keywords :
concentration quenching , terbium , Aluminum nitride
Journal title :
Journal of Luminescence
Serial Year :
2012
Journal title :
Journal of Luminescence
Record number :
1261107
Link To Document :
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