Title of article
Grain coarsening in gas pressure sintered silicon nitride
Author/Authors
Florence Cluzel Peillon، نويسنده , , François Thevenot، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2002
Pages
7
From page
637
To page
643
Abstract
The grain growth of silicon nitride sintered by GPS has been studied in the case of an α-rich initial powder. As time increases, the microstructure becomes bimodal. A few large grains grow abnormally at the expense of the smallest ones. The growth rate of the major portion of grains is slow and can be assimilated to a normal growth with interface-reaction control. This rate limiting mechanism has been determined by three different methods: a method based on the Kingery’rate laws, a more direct method based on the variation of the grain size vs. the amount of the liquid phase and considerations on grain morphology according to Lee.
Keywords
D. Silicon nitride , Grain coarsening , Diffusion control , Interface-reaction control
Journal title
Ceramics International
Serial Year
2002
Journal title
Ceramics International
Record number
1268474
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