Thick film compositions based on titanium silicides for surge resistors

Thick film compositions based on three titanium silicides: TiSi2, TiSi, and Ti5Si3 were prepared and investigated. Resistivities and temperature coefficients of resistance of the layers fired at 850 °C were measured in the temperature range −40 to +160 °C. The resistivities were 0.3–20 Ω per square for the layers containing Pd–Ag addition, fired in air and 20–300 Ω per square for those based exclusively on silicides, fired in nitrogen. Studies of the surge performance of Ti–Si resistors were carried out. The chosen compositions fired in air showed resistivity adequate to print resistors in the rectangular shape, more advantageous for surge resistors than the meander one, low TCR values and small changes in resistivity after high voltage pulsing.