Effect of rapid thermal annealing on residual stress in lead titanate thin film by chemical solution deposition

The effect of annealing process on the residual stress in the lead titanate (PT) thin film was investigated in this study. The residual stress in the films with different annealing process was calculated from the phonon mode shift. As a result, the residual stress in the films deposited by the rapid thermal annealing was larger than that in the films by normal annealing process. In addition, the large residual stress in the films by the rapid thermal annealing was relaxed by the post annealing to the value in the film deposited by normal annealing. Moreover, the dielectric behavior of the films obeyed the modified Devon Shire theory which was proposed in our previous study.