Recession mechanism of Lu2Si2O7 phase in high speed steam jet environment at high temperatures

The phase stability and recession mechanism of Lu2Si2O7 were examined in a high speed steam jet environment at 1300 and 1500 °C for a 100 h exposure time test. After high temperature steam jet exposure, a porous microstructure was formed on the exposed samples surface. Microstructural analysis indicated that the grain size of the 1500 °C sample was slightly larger than that of the 1300 °C sample. At 1300 °C, Lu2Si2O7 completely decomposed to form a Lu2SiO5. On the other hand, both Lu2SiO5 and Lu2Si2O7 phases were observed in the 1500 °C test sample.