Patterned Zn-seeds and selective growth of ZnO nanowire arrays on transparent conductive substrate and their field emission characteristics

A method for the patterned growth of ZnO nanorods with better field emission properties is presented that combines nanoimprinting, electroplated Zn seeds and aqueous solution growth of ZnO. A patterned Zn layer over large area was prepared using the poly(dimethylsiloxane) (PDMS) template to pattern PMMA masking layer without residual layer. ZnO nanorods were selectively deposited on the Zn seeds instead of growing on the bare ITO regions due to the preferred growth on Zn seeds/ITO substrate. The diameter of ZnO nanorods was decided by the concentration of reactants of zinc nitrate and hexamethyltetramine (C6H12N4) (0.025–0.1 M) at low temperature. This approach provides the capability of creating patterned 1D ZnO micro/nanopatterns at low temperature, ambient condition, and low cost with large area on flexible devices.